Virtuoso Heterogeneous Integration

Overview

Accelerating Heterogeneous Integration with Virtuoso Studio

Combining different types of semiconductors into a single system allows size and power reduction while providing higher performance RF, photonics, and wired interfaces. Integrating chiplets allows circuits to be implemented with individual but optimal processes, leading to overall reduced cost and faster time to market. Numerous advances in Cadence Virtuoso Studio allow designers to meet heterogeneous design challenges, such as multi-fabric co-analysis of electrical, electromagnetic (EM), and photonic signals, as well as system-level integration and verification, including power and thermal analysis.

Key Benefits

Edit-in-Concert Technology

Coordinated multi-user in-context editing of IC, package, and board

Cross-Fabric Analysis and Signoff

Including entire nets spanning IC, package, and board domains

Interoperability

Design where you like, with Virtuoso and Allegro platform interoperability

True Multi-Technology Environment

Virtuoso Studio infrastructure allows multiple concurrent PDKs used in your system designs

System DRC and LVS

Verify the connectivity and manufacturability of your entire system

Features

Implement Complete Systems:
Edit-in-Concert technology lets you edit simultaneously across fabrics and view the changes immediately at the system level within the environment. It enables RFIC, photonic IC (PIC), and system-in-package (SiP) module designers to edit the layout design in the context of all ICs on the module or other fabrics (chip, module, board). This ensures that connectivity between fabrics is always correct, manufacturable, and accurate. Cadence’s Allegro interoperability allows the import of building blocks into a system design, as well as finishing and tapeout of package designs using industry-standard tools and flows.
Cross-Fabric Analysis and Signoff:
With the entire system’s layout and schematic represented in the Virtuoso environment, you can simulate “golden” system schematics. Full designs can be extracted, and layout effects back-annotated to allow system-level validation. The inclusion of RF and photonics cross-fabric flows is crucial for today’s complex systems.